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袁博, 李斌. 纳电子学Crossbar结构容缺陷逻辑映射的覆盖率优化[J]. 计算机科学技术学报, 2012, 27(5): 979-988. DOI: 10.1007/s11390-012-1278-0
引用本文: 袁博, 李斌. 纳电子学Crossbar结构容缺陷逻辑映射的覆盖率优化[J]. 计算机科学技术学报, 2012, 27(5): 979-988. DOI: 10.1007/s11390-012-1278-0
Bo Yuan, Bin Li. Coverage Optimization for Defect-Tolerance Logic Mapping on Nanoelectronic Crossbar Architectures[J]. Journal of Computer Science and Technology, 2012, 27(5): 979-988. DOI: 10.1007/s11390-012-1278-0
Citation: Bo Yuan, Bin Li. Coverage Optimization for Defect-Tolerance Logic Mapping on Nanoelectronic Crossbar Architectures[J]. Journal of Computer Science and Technology, 2012, 27(5): 979-988. DOI: 10.1007/s11390-012-1278-0

纳电子学Crossbar结构容缺陷逻辑映射的覆盖率优化

Coverage Optimization for Defect-Tolerance Logic Mapping on Nanoelectronic Crossbar Architectures

  • 摘要: 新兴的纳米器件和对应的纳米结构技术被认为可以补充甚至替代传统的基于光刻的CMOS集成电路, 然而它们也面临着严重的高缺陷率挑战。在这篇文章中, 定义了一种新的权值覆盖率作为在纳电子学Crossbar结构功能设计中各种容缺陷逻辑映射算法的最重要的评价标准之一。与之前的工作相比, 这种新的标准可以更准确地计算给定逻辑函数下所需Crossbar的模块数。基于这种新的标准, 进一步提出一种基于遗传算法GA的有效的逻辑映射算法。通过一系列对不同规模和缺陷密度的测试问题的实验, 提出的算法与所知最先进的贪婪算法作比较显示了相当好的效果和鲁棒性, 尤其在大规模和高缺陷率问题上性能优越。

     

    Abstract: Emerging nano-devices with the corresponding nano-architectures are expected to supplement or even replace conventional lithography-based CMOS integrated circuits, while, they are also facing the serious challenge of high defect rates. In this paper, a new weighted coverage is defined as one of the most important evaluation criteria of various defect- tolerance logic mapping algorithms for nanoelectronic crossbar architectures functional design. This new criterion is proved by experiments that it can calculate the number of crossbar modules required by the given logic function more accurately than the previous one presented by Yellambalase et al. Based on the new criterion, a new effective mapping algorithm based on genetic algorithm (GA) is proposed. Compared with the state-of-the-art greedy mapping algorithm, the proposed algorithm shows pretty good effectiveness and robustness in experiments on testing problems of various scales and defect rates, and superior performances are observed on problems of large scales and high defect rates.

     

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